In order to fulfil Moore’s law, the dimensions of the key elements of integrated circuits have been reduced to single digit nanometers. Besides enormous challenges for the micro- and nano fabrication methods itself, metrology is required for quality control to provide sub-nanometer uncertainties. Within the two EU founded projects ATMOC and POLight this challenge is tackled. In real world samples, deviations from the ideal geometries are encountered due to the complexities of fabrication processes. Understanding of these processes guides the development of procedures and helps in the reconstruction of the geometry from various scatterometric measurements. Here, we are reporting on the fabrication of reference samples for the mentioned projects and discuss the technological origins for such deviations.

19^th IMEKO TC10 Conference "Measurement for Diagnostics, Optimisation and Control to Support Sustainability and Resilience"