Investigation of nano-SQUIDs with Dayem bridges by e-beam lithography and reaction ion etching |
|---|
| Xueshen Wang, Jinjin Li, Yuan Zhong, Qing Zhong |
- Abstract:
- Nano-SQUIDs are sensitive devices for quantum detection and precision measurements due to the ultra-low noise level. This paper reports the fabrication and characterization of nano-SQUIDs fabricated by e-beam lithography and reaction ion etching (RIE). The Nano-SQUIDs were comprised by two Dayem nanobridges and a loop based on the monolayer Nb film. The width of the nanobridges was 94 nm and the diameter of the loop was 20 µm. A measurement system based on a physical properties measurement system and source-meters. The voltage-bias current (Ibias-V) properties at different temperatures showed that the working range of the nano-squid was 8.3 K to 7.0 K. The voltage-modulation flux (V-?) were characterized at 8.2 K and the flux modulation depth was large to be 74.5% with the bias current 287 µA. The Ibias-V and V-? (Icoil) showed that the e-beam lithography and RIE process were suitable for fabrication of nano-SQUIDs.
- Keywords:
- nano-SQUID, E-beam, RIE, measurement
- Download:
- IMEKO-TC4-2019-005.pdf
- DOI:
- -