TARGET ANALYSIS BY FOCUSING ELLIPSOMETRY |
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| U. Neuschaefer-Rube, W. Holzapfel, F. Wirth |
- Abstract:
- Reflection ellipsometry is a proven optical measurement method often used to measure film thicknesses. Classical ellipsometers use an unfocused measurement beam, which causes a low lateral resolution in the order of 1 mm. To determine microstructures ellipsometrically (e.g. in the semiconductor industry), an improved lateral resolution in the order of micrometers is essential. We discuss the problems of focusing ellipsometry, occurring when a reflection ellipsometer is used to measure surface characteristics (topography, material). Different measurement setups are analyzed and compared. Simulating calculations show that particularly the measured values of the phase difference Δ are influenced by beam focusing. This leads to errors particularly in the attenuation index k of the surface material.
- Keywords:
- optical measurement, ellipsometry, beam focusing
- Download:
- IMEKO-WC-2000-TC2-P046.pdf
- DOI:
- -
- Event details
- Event name:
- XVI IMEKO World Congress
- Title:
Measurement - Supports Science - Improves Technology - Protects Environment ... and Provides Employment - Now and in the Future
- Place:
- Vienna, AUSTRIA
- Time:
- 25 September 2000 - 28 September 2000