LASER FOCUSING OF CHROMIUM ATOMS

C. Yin, J. Qian, J. Wang, C. Shi
Abstract:
Atom lithography can be used to fabricate regular nanoscale pattern on a substrate with high resolution and large area. Because the pitch of the grating is traceable to absolute atomic frequency, it has potential to be used as nanoscale pitch standards. The researches on laser focusing chromium in national institute of metrology are reported in this paper. Chromium wire array with a pitch of λ/2 and a height of 1 nm has been deposited on InP substrate.
Keywords:
atom lithography, chromium, laser focusing, nanoscale pitch, calibration
Download:
IMEKO-WC-2012-SS2-O2.pdf
DOI:
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Event details
Event name:
XX IMEKO World Congress
Title:

Metrology for Green Growth

Place:
Busan, REPUBLIC of KOREA
Time:
09 September 2012 - 12 September 2012